Vacuum Ultraviolet Xenon Excimer Light Source Excited by a Pulsed Jet Discharge.
نویسندگان
چکیده
منابع مشابه
Characterization of a liquid-xenon-jet laser-plasma extreme-ultraviolet source
A liquid-xenon-jet laser-plasma source for extreme-ultraviolet ~EUV! and soft-x-ray generation has been characterized. Being a source candidate for EUV lithography ~EUVL!, we especially focus on parameters important for the integration of the source in EUVL systems. The deep-ultraviolet ~DUV! out-of-band radiation ~l5120–400 nm! was quantified, to within a factor of two, using a flying-circus t...
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ژورنال
عنوان ژورنال: The Review of Laser Engineering
سال: 1995
ISSN: 0387-0200,1349-6603
DOI: 10.2184/lsj.23.389